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New, highly versatile bimolecular photoinitiating systems for free-radical, cationic and thiol–ene photopolymerization processes under low light intensity UV and visible LEDs for 3D printing application

2020
journal article
article
10.1039/C9RA10212D
Journal
RSC Advances
100
Author
Hola Emilia

Topa Monika

Chachaj-Brekiesz Anna

Pilch Maciej

Fiedor Paweł
Show more
Volume
10
Number
13
Pages
7509-7522
eISSN
2046-2069
URL
https://pubs.rsc.org/en/content/articlepdf/2020/ra/c9ra10212d
Access date
2020-10-23
Language
English
Journal language
English
Affiliation
Wydział Chemii : Zakład Chemii Ogólnej
Scopus© citations
61
cris.lastimport.wos2024-04-10T01:03:38Z
dc.affiliationWydział Chemii : Zakład Chemii Ogólnejpl
dc.contributor.authorHola, Emiliapl
dc.contributor.authorTopa, Monikapl
dc.contributor.authorChachaj-Brekiesz, Anna - 126191 pl
dc.contributor.authorPilch, Maciejpl
dc.contributor.authorFiedor, Pawełpl
dc.contributor.authorGalek, Mariusz - 126293 pl
dc.contributor.authorOrtyl, Joannapl
dc.date.accession2020-10-23pl
dc.date.accessioned2020-10-23T11:26:36Z
dc.date.available2020-10-23T11:26:36Z
dc.date.issued2020pl
dc.date.openaccess0
dc.description.accesstimew momencie opublikowania
dc.description.number13pl
dc.description.physical7509-7522pl
dc.description.publication1,6pl
dc.description.versionostateczna wersja wydawcy
dc.description.volume10pl
dc.identifier.doi10.1039/C9RA10212Dpl
dc.identifier.eissn2046-2069pl
dc.identifier.projectROD UJ / OPpl
dc.identifier.urihttps://ruj.uj.edu.pl/xmlui/handle/item/251128
dc.identifier.weblinkhttps://pubs.rsc.org/en/content/articlepdf/2020/ra/c9ra10212dpl
dc.languageengpl
dc.language.containerengpl
dc.rightsUdzielam licencji. Uznanie autorstwa - Użycie niekomercyjne 3.0*
dc.rights.licenceCC-BY-NC
dc.rights.urihttp://creativecommons.org/licenses/by-nc/3.0/legalcode*
dc.share.typeotwarte czasopismo
dc.source.integratorfalse
dc.subtypeArticlepl
dc.titleNew, highly versatile bimolecular photoinitiating systems for free-radical, cationic and thiol–ene photopolymerization processes under low light intensity UV and visible LEDs for 3D printing applicationpl
dc.title.journalRSC Advancespl
dc.typeJournalArticlepl
dspace.entity.typePublication
cris.lastimport.wos
2024-04-10T01:03:38Z
dc.affiliationpl
Wydział Chemii : Zakład Chemii Ogólnej
dc.contributor.authorpl
Hola, Emilia
dc.contributor.authorpl
Topa, Monika
dc.contributor.authorpl
Chachaj-Brekiesz, Anna - 126191
dc.contributor.authorpl
Pilch, Maciej
dc.contributor.authorpl
Fiedor, Paweł
dc.contributor.authorpl
Galek, Mariusz - 126293
dc.contributor.authorpl
Ortyl, Joanna
dc.date.accessionpl
2020-10-23
dc.date.accessioned
2020-10-23T11:26:36Z
dc.date.available
2020-10-23T11:26:36Z
dc.date.issuedpl
2020
dc.date.openaccess
0
dc.description.accesstime
w momencie opublikowania
dc.description.numberpl
13
dc.description.physicalpl
7509-7522
dc.description.publicationpl
1,6
dc.description.version
ostateczna wersja wydawcy
dc.description.volumepl
10
dc.identifier.doipl
10.1039/C9RA10212D
dc.identifier.eissnpl
2046-2069
dc.identifier.projectpl
ROD UJ / OP
dc.identifier.uri
https://ruj.uj.edu.pl/xmlui/handle/item/251128
dc.identifier.weblinkpl
https://pubs.rsc.org/en/content/articlepdf/2020/ra/c9ra10212d
dc.languagepl
eng
dc.language.containerpl
eng
dc.rights*
Udzielam licencji. Uznanie autorstwa - Użycie niekomercyjne 3.0
dc.rights.licence
CC-BY-NC
dc.rights.uri*
http://creativecommons.org/licenses/by-nc/3.0/legalcode
dc.share.type
otwarte czasopismo
dc.source.integrator
false
dc.subtypepl
Article
dc.titlepl
New, highly versatile bimolecular photoinitiating systems for free-radical, cationic and thiol–ene photopolymerization processes under low light intensity UV and visible LEDs for 3D printing application
dc.title.journalpl
RSC Advances
dc.typepl
JournalArticle
dspace.entity.type
Publication
Affiliations
Wydział Chemii
Chachaj-Brekiesz, Anna
No affiliation
Hola, Emilia
Topa, Monika
Pilch, Maciej
Fiedor, Paweł
Galek, Mariusz
Ortyl, Joanna

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