In the present study we have characterized the halogen bonding in selected molecules H 3 N – ICF 3 ( 1- NH 3 ), (PH 3 ) 2 C – ICF 3 ( 1-CPH 3 ), C 3 H 7 Br – (IN 2 H 2 C 3 ) 2 C 6 H 4 ( 2-Br ), H 2 – (IN 2 H 2 C 3 ) 2 C 6 H 4 ( 2-H 2 ) and Cl – (IC 6 F 5 ) 2 C 7 H 10 N 2 O 5 ( 3-Cl) , containing from one halogen bond ( 1-NH 3 , 1-CPH 3 ) up to four connections in 3-Cl (the two Cl – HN and two Cl – I), based on recently proposed ETS- NOCV analysis. It was found based on the NOCV- deformation density components that the halogen bonding C – X ... B (X-halogen atom, B-Lewis base), contains a large degree of covalent contribution (the charge transfer to X ... B inter-atomic region) supported further by the electron dona- tion from base atom B to the empty σ *(C – X) orbital. Such charge transfers can be of similar importance compared to the electrostatic stabilization. Further, the covalent part of halogen bonding is due to the presence of σ -hole at outer part of halogen atom (X). ETS-NOCV approach allowed to visualize formation of the σ -hole at iodine atom of CF 3 I molecule. It has also been demonstrated that strongly elec- trophilic halogen bond donor, [C 6 H 4 (C 3 H 2 N 2 I) 2 ][OTf] 2 , can activate chemically inert isopropyl bromide ( 2-Br ) moiety via formation of Br – I bonding and bind the hydrogen mol- ecule ( 2-H 2 ). Finally, ETS-NOCVanalysis performed for 3- Cl leads to the conclusion that, in terms of the orbital- interaction component, the strength of halogen (Cl – I) bond is roughly three times more important than the hydrogen bonding (Cl – HN).