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ETS-NOCV description of σ-hole bonding


ETS-NOCV description of σ-hole bonding

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dc.contributor.author Dyduch, Karol [USOS36291] pl
dc.contributor.author Mitoraj, Mariusz [SAP11019444] pl
dc.contributor.author Michalak, Artur [SAP11015048] pl
dc.date.accessioned 2015-06-23T11:09:42Z
dc.date.available 2015-06-23T11:09:42Z
dc.date.issued 2013 pl
dc.identifier.issn 1610-2940 pl
dc.identifier.uri http://ruj.uj.edu.pl/xmlui/handle/item/10112
dc.language eng pl
dc.rights Udzielam licencji. Uznanie autorstwa 4.0 Międzynarodowa *
dc.rights.uri http://creativecommons.org/licenses/by/4.0/pl/legalcode *
dc.title ETS-NOCV description of σ-hole bonding pl
dc.type JournalArticle pl
dc.description.physical 2747-2758 pl
dc.description.additional Karol Dyduch - Department of Theoretical Chemistry, Faculty of Chemistry, Jagiellonian University pl
dc.identifier.weblink https://link.springer.com/content/pdf/10.1007%2Fs00894-012-1591-0.pdf pl
dc.abstract.en The ETS-NOCVanalysis was applied to describe the σ -hole in a systematic way in a series of halogen com- pounds, CF 3 -X ( X 0 I, Br, Cl, F), CH 3 I, and C(CH3) n H 3-n -I ( n 0 1,2,3), as well as for the example germanium-based systems. GeXH 3 , X 0 F,Cl,H.Further,theETS-NOCV analysis was used to characterize bonding with ammonia for these systems. The results show that the dominating contribution to the deformation density, Δ ρ 1 , exhibits the negative-value area with a minimum, corresponding to σ - hole. The “ size ” (spatial extension of negative value) and “ depth ” (minium value) of the σ -hole varies for different X in CF 3 -X, and is influenced by the carbon substituents (fluorine atoms, hydrogen atoms, methyl groups). The size and depth of σ -hole decreases in the order: I, Br, Cl, F in CF 3 -X. In CH 3 -I and C(CH3) n H 3-n -I, compared to CF 3 -I, introduction of hydrogen atoms and their subsequent replacements by methyl groups lead to the systematic de- crease in the σ -hole size and depth. The ETS-NOCV σ -hole picture is consistent with the existence the positive MEP area at the extension of σ -hole generating bond. Finally, the NOCV deformation density contours as well as by the ETS orbital-interaction e nergy indicate that the σ -hole-based bond with ammonia contains a degree of covalent contribu- tion. In all analyzed systems, it was found that the electro- static energy is approximately two times larger than the orbital-interaction term, confirming the indisputable role of the electrostatic stabilization in halogen bonding and σ -hole bonding. pl
dc.description.volume 19 pl
dc.description.number 7 pl
dc.identifier.doi 10.1007/s00894-012-1591-0 pl
dc.identifier.eissn 0948-5023 pl
dc.title.journal Journal of Molecular Modeling pl
dc.language.container eng pl
dc.date.accession 2019-02-07 pl
dc.affiliation Wydział Chemii : Zakład Chemii Teoretycznej im. K. Gumińskiego pl
dc.affiliation Wydział Chemii : Zakład Metod Obliczeniowych Chemii pl
dc.subtype Article pl
dc.rights.original CC-BY; inne; ostateczna wersja wydawcy; w momencie opublikowania; 0; pl
dc.identifier.project ROD UJ / P pl
.pointsMNiSW [2013 A]: 25

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Udzielam licencji. Uznanie autorstwa 4.0 Międzynarodowa Except where otherwise noted, this item's license is described as Udzielam licencji. Uznanie autorstwa 4.0 Międzynarodowa