abstract in English: |
The ETS-NOCVanalysis was applied to describe
the
σ
-hole in a systematic way in a series of halogen com-
pounds, CF
3
-X (
X
0
I, Br, Cl, F), CH
3
I, and C(CH3)
n
H
3-n
-I
(
n
0
1,2,3), as well as for the example germanium-based
systems. GeXH
3
,
X
0
F,Cl,H.Further,theETS-NOCV
analysis was used to characterize bonding with ammonia
for these systems. The results show that the dominating
contribution to the deformation density,
Δ
ρ
1
, exhibits the
negative-value area with a minimum, corresponding to
σ
-
hole. The
“
size
”
(spatial extension of negative value) and
“
depth
”
(minium value) of the
σ
-hole varies for different X
in CF
3
-X, and is influenced by the carbon substituents
(fluorine atoms, hydrogen atoms, methyl groups). The size
and depth of
σ
-hole decreases in the order: I, Br, Cl, F in
CF
3
-X. In CH
3
-I and C(CH3)
n
H
3-n
-I, compared to CF
3
-I,
introduction of hydrogen atoms and their subsequent
replacements by methyl groups lead to the systematic de-
crease in the
σ
-hole size and depth. The ETS-NOCV
σ
-hole
picture is consistent with the existence the positive MEP
area at the extension of
σ
-hole generating bond. Finally, the
NOCV deformation density contours as well as by the ETS
orbital-interaction e
nergy indicate that the
σ
-hole-based
bond with ammonia contains a degree of covalent contribu-
tion. In all analyzed systems, it was found that the electro-
static energy is approximately two times larger than the
orbital-interaction term, confirming the indisputable role of
the electrostatic stabilization in halogen bonding and
σ
-hole
bonding. |