Plasma-assisted nanoscale protein patterning on Si substrates via colloidal lithography

2013
journal article
article
cris.lastimport.scopus2024-04-07T17:14:25Z
dc.abstract.enSelective immobilization of proteins in well-defined patterns on substrates has recently attracted considerable attention as an enabling technology for applications ranging from biosensors and BioMEMS to tissue engineering. In this work, a method is reported for low-cost, large scale and high throughput, selective immobilization of proteins on nanopatterned Si, based on colloidal lithography and plasma processing to define the areas( < 300 nm) where proteins are selectively immobilized. A close-packed monolayer of PS microparticles is deposited on oxidized Si and, either after microparticle size reduction or alternatively after metal deposition through the PS close-packed monolayer, is used as etching mask to define $SiO_{2}$ nanoislands (on Si). $C_{4} F_{8}$ plasma was used to selectively etch and modify the $SiO_{2}$ nanoislands while depositing a fluorocarbon layer on the Si surface. The plasma-treated surfaces were chemically characterized in terms of functional group identification through XPS analysis and reaction with specific molecules. Highly selective protein immobilization mainly through physical adsorption on $SiO_{2}$ nanoislands and not on surrounding Si was observed after $C_{4} F_{8}$ plasma-induced chemical modification of the substrate. The thickness of the immobilized protein monolayer was estimated by means of AFM image analysis. The method reported herein constitutes a cost-efficient route toward rapid, large surface, and high-density patterning of biomolecules on solid supports that can be easily applied in BioMEMS or microanalytical systems.pl
dc.affiliationWydział Fizyki, Astronomii i Informatyki Stosowanej : Instytut Fizyki im. Mariana Smoluchowskiegopl
dc.contributor.authorMalainou, A.pl
dc.contributor.authorTsougeni, K.pl
dc.contributor.authorEllinas, K.pl
dc.contributor.authorPetrou, P. S.pl
dc.contributor.authorConstantoudis, V.pl
dc.contributor.authorSarantopoulou, E.pl
dc.contributor.authorAwsiuk, Kamil - 103592 pl
dc.contributor.authorBernasik, A.pl
dc.contributor.authorBudkowski, Andrzej - 127461 pl
dc.contributor.authorMarkou, A.pl
dc.contributor.authorPanagiotopoulos, I.pl
dc.contributor.authorKakabakos, S. E.pl
dc.contributor.authorGogolides, E.pl
dc.contributor.authorTserepi, A.pl
dc.date.accessioned2015-07-01T10:58:59Z
dc.date.available2015-07-01T10:58:59Z
dc.date.issued2013pl
dc.description.number50pl
dc.description.physical13743-13751pl
dc.description.publication0,5pl
dc.description.volume117pl
dc.identifier.doi10.1021/jp407810xpl
dc.identifier.eissn1520-5215pl
dc.identifier.issn1089-5639pl
dc.identifier.urihttp://ruj.uj.edu.pl/xmlui/handle/item/11016
dc.languageengpl
dc.language.containerengpl
dc.rightsDodaję tylko opis bibliograficzny*
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dc.subtypeArticlepl
dc.titlePlasma-assisted nanoscale protein patterning on Si substrates via colloidal lithographypl
dc.title.journalThe Journal of Physical Chemistry. Apl
dc.typeJournalArticlepl
dspace.entity.typePublication
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